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About Us

RASIRC specializes in products that generate and deliver gas to fabrication processes. Each unit is a dynamic gas plant in a box—converting common liquid chemistries into safe and reliable gas flow for most processes. First to generate ultra-high purity (UHP) steam from de-ionized water, RASIRC technology can now also deliver hydrogen peroxide gas in controlled, repeatable concentrations.

RASIRC products include:

The company was founded by Jeffrey Spiegelman, former president and founder of Aeronex, Inc., a company that designed and manufactured gas purification systems.

RASIRC holds the following patents and trademarks.

  • Patent #7,618,027: This patent is for a vaporizing device for control, delivery, and purification of water vapor in conjunction with a carrier gas. The patent is used in RainMaker humidification systems (RHS) to control the transfer and purification of water vapor directly into a carrier gas stream including inert, corrosive, and flammable gases, such as hydrogen, at a wide range of flow rates for use in solar, microelectronics, and other critical process applications. Read the press release >>
  • Patent #7,625,015B2: This patent is for a novel adhesive and weld-free assembly technique for working with membranes and ultrapure materials. The patented process allows for the simultaneous sealing of multiple tubes within a single outer shell when an external radial compressive force is applied and is used in both RainMaker humidification systems (RHS) and RASIRC Steamers.
  • Patent #8,282,708: This patent is for a novel method of producing ultrapure steam. The method is based on the ability to generate a high rate of diffusion of water vapor through a non-porous membrane. The patent is used in RASIRC products including RASIRC Steamers that deliver ultra-high purity steam for a variety of applications including wet thermal oxidation and wafer cleaning for MEMS and semiconductor devices, backside passivation for solar cells, and steam annealing for amorphous metal oxide thin film transistors (TFTs).
  • Trademark: RASIRC
  • Trademark: RainMaker
 


Recent News

July 9, 2015
Hydrogen Peroxide Gas for Next Generation Semiconductor Processes
RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions

June 25, 2015
RASIRC Presents Test Results Showing Stable Delivery of Hydrogen Peroxide Gas With or Without Water

June 17, 2015
New RASIRC Peroxidizer® Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes

Article
January/February 2015
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Article
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

October 21, 2014
RASIRC Technology Successfully Used to Clean and Prepare Germanium Surfaces: High Purity Hydrogen Peroxide Vapor Delivered In-Situ

September 15, 2014
RASIRC enables liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

July 23, 2013
RASIRC Announces Dry Peroxide™ Oxidant at ALD 2013

July 8, 2013
RASIRC to Bring Dry Peroxide™ to SemiconWest/InterSolar 2013

June 27, 2013
RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition

May 30, 2013
RASIRC Presents at Sematech Surface Preparation and Cleaning Conference

May 8, 2013
RASIRC Presents Poster on Novel Hydrogen Peroxide Vapor Delivery System

October 25, 2012
RASIRC Introduces Steamer 225 for Vacuum & Atmospheric Processes

October 9, 2012
RASIRC Earns ISO 9001:2008 Certification

September 18, 2012
RASIRC Releases Results on Hydrogen Peroxide Vapor Delivery Systems for Surface Cleaning

Aug 28, 2012
MATHESON Acquires Majority Share of RASIRC

 
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