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About Us

RASIRC specializes in products that generate and deliver gas to fabrication processes. Each unit is a dynamic gas plant in a box—converting common liquid chemistries into safe and reliable gas flow for most processes. First to generate ultra-high purity (UHP) steam from de-ionized water, RASIRC technology can now also deliver hydrogen peroxide gas in controlled, repeatable concentrations.

RASIRC products include:

The company was founded by Jeffrey Spiegelman, former president and founder of Aeronex, Inc., a company that designed and manufactured gas purification systems.

RASIRC holds the following patents and trademarks.

  • Patent #7,618,027: This patent is for a vaporizing device for control, delivery, and purification of water vapor in conjunction with a carrier gas. The patent is used in RainMaker humidification systems (RHS) to control the transfer and purification of water vapor directly into a carrier gas stream including inert, corrosive, and flammable gases, such as hydrogen, at a wide range of flow rates for use in solar, microelectronics, and other critical process applications. Read the press release >>
  • Patent #7,625,015B2: This patent is for a novel adhesive and weld-free assembly technique for working with membranes and ultrapure materials. The patented process allows for the simultaneous sealing of multiple tubes within a single outer shell when an external radial compressive force is applied and is used in the RainMaker Humidification System (RHS).
  • Patent #8,282,708: This patent is for a novel method of producing ultrapure steam. The method is based on the ability to generate a high rate of diffusion of water vapor through a non-porous membrane. The patent is used in RASIRC products for a variety of applications including wet thermal oxidation and wafer cleaning for MEMS and semiconductor devices, backside passivation for solar cells, and steam annealing for amorphous metal oxide thin film transistors (TFTs).
  • Trademark: RASIRC
  • Trademark: RainMaker
  • Trademark: Peroxidizer
 


Recent News

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2017
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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