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Management Team

RASIRC CEOJeff Spiegelman
President and CEO

Jeffrey Spiegelman has worked in the semiconductor industry since 1986. In 1990 he founded Aeronex, which was named one of Inc. Magazine's Top 500 Fastest Growing Private Companies and was awarded the prestigious University of California's Connect award for Most Innovative New Product in 2002. After selling the company to Entegris, Spiegelman founded RASIRC to address generation and delivery of new chemistries, with an initial focus on steam and pure condensate.

Spiegelman has a BS in bioengineering, an MS in Applied Mechanics from University of California at San Diego, and holds over 50 international patents and publications.

Daniel AlvarezDan Alvarez, Ph.D.
Chief Technology Officer

Daniel Alvarez is responsible for the strategic technology roadmap for RASIRC, including identifying opportunities and planning for risk and growth.

Alvarez earned a Ph.D. in Inorganic Chemistry from Indiana University, holds 18 US Patents and has written more than 20 technical and scientific publications. Alvarez has worked in a variety of technology companies, including 3M Corporation, Aeronex and Mykrolis Corporation. He has also worked as a Fellow at California Institute of Technology and a Chemistry Instructor at Community Colleges.

 


Recent News

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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