Management Team

RASIRC CEOJeff Spiegelman
President and CEO

Jeffrey Spiegelman has worked in the semiconductor industry since 1986. In 1990 he founded Aeronex, which was named one of Inc. Magazine's Top 500 Fastest Growing Private Companies and was awarded the prestigious University of California's Connect award for Most Innovative New Product in 2002. After selling the company to Entegris, Spiegelman founded RASIRC to address generation and delivery of new chemistries, with an initial focus on steam and pure condensate.

Spiegelman has a BS in bioengineering, an MS in Applied Mechanics from University of California at San Diego, and holds over 50 international patents and publications.

Daniel AlvarezDan Alvarez, Ph.D.
Chief Technology Officer

Daniel Alvarez is responsible for the strategic technology roadmap for RASIRC, including identifying opportunities and planning for risk and growth. Alvarez earned a Ph.D. in Inorganic Chemistry from Indiana University, holds 18 US Patents and has written more than 20 technical and scientific publications. Alvarez has worked in a variety of technology companies, including 3M Corporation, Aeronex and Mykrolis Corporation. He has also worked as a Fellow at California Institute of Technology and a Chemistry Instructor at Community Colleges.

Bruce Lipisko, General ManagerBruce Lipisko
Chief Operating Officer

Bruce Lipisko is responsible for manufacturing, supply chain, account management and customer service. With almost 25 years of semiconductor industry experience, he has held multiple senior level positions including: Chief Operating Officer at OnWafer Technologies, and Vice President & General Manager of the Microelectronic Materials Group at Arch Chemicals.

Lipisko holds a Bachelor Degree in Chemistry, an MBA from The Pennsylvania State University and a Masters in Chemistry from the University of Pittsburgh. Lipisko also holds a dozen international patents and publications.


Recent News

June 17, 2015
New RASIRC Peroxidizer® Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes

January/February 2015
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

October 21, 2014
RASIRC Technology Successfully Used to Clean and Prepare Germanium Surfaces: High Purity Hydrogen Peroxide Vapor Delivered In-Situ

September 15, 2014
RASIRC enables liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

June 27, 2013
RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition

May 30, 2013
RASIRC Presents at Sematech Surface Preparation and Cleaning Conference

May 8, 2013
RASIRC Presents Poster on Novel Hydrogen Peroxide Vapor Delivery System

October 9, 2012
RASIRC Earns ISO 9001:2008 Certification

September 18, 2012
RASIRC Releases Results on Hydrogen Peroxide Vapor Delivery Systems for Surface Cleaning

Aug 28, 2012
MATHESON Acquires Majority Share of RASIRC