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Privacy Policy

We respect and are committed to protecting your privacy. This Privacy Policy lets you know how your personal information is processed and used. We promise that we will take steps to use your personal information only in ways that are compatible with this Privacy Policy.

You can visit RASIRC on the Web without telling us who you are and without disclosing any information about yourself. You may choose to give us personal information, such as your name, your company’s name and address or your e-mail. This information may be used by RASIRC to correspond with you. It is our intention to let you know how we will use such information before we collect it from you on the Internet. We intend to protect the quality and integrity of the information you provide us. We sometimes collect anonymous information from visits to our sites. This information is used strictly to improve our Web site performance and the information we provide you. We will never sell your information to other parties.

In order to ensure the fastest, most thorough customer service, RASIRC may use auto-replies to respond to your e-mails. We hope the information found in our replies helps you with any inquiries.

 


Recent News

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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