Privacy Policy

We respect and are committed to protecting your privacy. This Privacy Policy lets you know how your personal information is processed and used. We promise that we will take steps to use your personal information only in ways that are compatible with this Privacy Policy.

You can visit RASIRC on the Web without telling us who you are and without disclosing any information about yourself. You may choose to give us personal information, such as your name, your company’s name and address or your e-mail. This information may be used by RASIRC to correspond with you. It is our intention to let you know how we will use such information before we collect it from you on the Internet. We intend to protect the quality and integrity of the information you provide us. We sometimes collect anonymous information from visits to our sites. This information is used strictly to improve our Web site performance and the information we provide you. We will never sell your information to other parties.

In order to ensure the fastest, most thorough customer service, RASIRC may use auto-replies to respond to your e-mails. We hope the information found in our replies helps you with any inquiries.


Recent News

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

July 21, 2016
RASIRC Presents Two New Molecules for Growth of Low Temperature Nitrides and Oxides at ALD Conference

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Feb 16, 2016
RASIRC Water Free Anhydrous Hydrogen Peroxide Demonstrates Five-Fold Increase in Hydroxyl Density

Recent Articles

June 22, 2016
Jonas Sundqvist
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Rocket Fuel May Propel Moore's Law
LinkedIn Post by Ed Korcynski
Senior Technical Editor
Solid State Technology

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor