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H2O2 Gas for Annealing

Annealing and passivation are techniques used to repair atomic defects within the crystal that propagate into the wafer macrostructure, reducing efficiencies in microelectronics. Passivation, or thermal annealing, of the interface limits hole/electron recombination, removes dangling bonds, and reduces vacancies and dislocations at grain boundaries.

High concentration H2O2 gas delivered by the Peroxidizer® is well-suited for annealing applications where high speed deposition and low operating temperatures are required. H2O2 gas is a good oxidant that can penetrate deep structures. More aggressive oxidants like plasma and ozone can damage surface materials and sensitive structures. H2O2 gas reduces the required thermal budget, protecting against high heat exposure that causes film shrinkage.

The ability to replace water vapor and steam with hydrogen peroxide gas reduces time and operating temperature. High concentration hydrogen peroxide gas will enable the next generation gap fill technology, a must for success with 3D structures.

To learn more about how the Peroxidizer can assist with your processes, fill out this Peroxidizer Information Request form.

 


Recent News

Oct 14, 2015
RASIRC Methods for Safe and Stable Delivery of Hydrogen Peroxide Gas and Hydrazine Gas for ALD
Company presents technical sessions and exhibits at AVS Symposium

July 9, 2015
Hydrogen Peroxide Gas for Next Generation Semiconductor Processes: RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions

June 25, 2015
RASIRC Presents Test Results Showing Stable Delivery of Hydrogen Peroxide Gas With or Without Water: Company presents posters and exhibits at ALD Conference and ALE Workshop

June 17, 2015
New RASIRC Peroxidizer® Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes

Recent Articles

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

 

 
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