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H2O2 Gas for Annealing

Annealing and passivation are techniques used to repair atomic defects within the crystal that propagate into the wafer macrostructure, reducing efficiencies in microelectronics. Passivation, or thermal annealing, of the interface limits hole/electron recombination, removes dangling bonds, and reduces vacancies and dislocations at grain boundaries.

High concentration H2O2 gas delivered by the Peroxidizer® is well-suited for annealing applications where high speed deposition and low operating temperatures are required. H2O2 gas is a good oxidant that can penetrate deep structures. More aggressive oxidants like plasma and ozone can damage surface materials and sensitive structures. H2O2 gas reduces the required thermal budget, protecting against high heat exposure that causes film shrinkage.

The ability to replace water vapor and steam with hydrogen peroxide gas reduces time and operating temperature. High concentration hydrogen peroxide gas will enable the next generation gap fill technology, a must for success with 3D structures.

To learn more about how the Peroxidizer can assist with your processes, fill out this Peroxidizer Information Request form.

 


Recent News

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 22, 2016
Jonas Sundqvist
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

May 31, 2016
RASIRC Presents Novel Source for Oxidation and Nitridation for Atomic Layer Deposition

May 17, 2016
RASIRC Presents Hydrazine as Low Temperature Nitride Source at Critical Materials Conference

April 14, 2016
RASIRC to Present at Surface Preparation and Cleaning (SPCC) Conference

Feb 16, 2016
RASIRC Water Free Anhydrous Hydrogen Peroxide Demonstrates Five-Fold Increase in Hydroxyl Density

Recent Articles

April 7, 2016
Rocket Fuel May Propel Moore's Law
LinkedIn Post by Ed Korcynski
Senior Technical Editor
Solid State Technology

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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