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H2O2 Gas for Annealing

Annealing and passivation are techniques used to repair atomic defects within the crystal that propagate into the wafer macrostructure, reducing efficiencies in microelectronics. Passivation, or thermal annealing, of the interface limits hole/electron recombination, removes dangling bonds, and reduces vacancies and dislocations at grain boundaries.

High concentration H2O2 gas delivered by the Peroxidizer® is well-suited for annealing applications where high speed deposition and low operating temperatures are required. H2O2 gas is a good oxidant that can penetrate deep structures. More aggressive oxidants like plasma and ozone can damage surface materials and sensitive structures. H2O2 gas reduces the required thermal budget, protecting against high heat exposure that causes film shrinkage.

The ability to replace water vapor and steam with hydrogen peroxide gas reduces time and operating temperature. High concentration hydrogen peroxide gas will enable the next generation gap fill technology, a must for success with 3D structures.

To learn more about how the Peroxidizer can assist with your processes, fill out this Peroxidizer Information Request form.

 


Recent News

July 9, 2015
Hydrogen Peroxide Gas for Next Generation Semiconductor Processes
RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions

June 25, 2015
RASIRC Presents Test Results Showing Stable Delivery of Hydrogen Peroxide Gas With or Without Water

June 17, 2015
New RASIRC Peroxidizer® Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes

Article
January/February 2015
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Article
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

October 21, 2014
RASIRC Technology Successfully Used to Clean and Prepare Germanium Surfaces: High Purity Hydrogen Peroxide Vapor Delivered In-Situ

September 15, 2014
RASIRC enables liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

July 23, 2013
RASIRC Announces Dry Peroxide™ Oxidant at ALD 2013

July 8, 2013
RASIRC to Bring Dry Peroxide™ to SemiconWest/InterSolar 2013

June 27, 2013
RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition

May 30, 2013
RASIRC Presents at Sematech Surface Preparation and Cleaning Conference

May 8, 2013
RASIRC Presents Poster on Novel Hydrogen Peroxide Vapor Delivery System

October 25, 2012
RASIRC Introduces Steamer 225 for Vacuum & Atmospheric Processes

October 9, 2012
RASIRC Earns ISO 9001:2008 Certification

September 18, 2012
RASIRC Releases Results on Hydrogen Peroxide Vapor Delivery Systems for Surface Cleaning

Aug 28, 2012
MATHESON Acquires Majority Share of RASIRC

 
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