UltraPure Steam in Immersion Lithography
Immersion lithography places a layer of pure water between the projection lens and the wafer. Any contaminant within the water can lead to change in refractive index and a project defect on the wafer. Micro-bubbles in the water can also lead to project defects on the wafer.
RASIRC Steamers deliver ultrapure water at point of use that is ionically pure, particle free, and free of micro-bubbles, providing a competitive advantage to the lithography tool manufacturer.
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