Japanese Datasheets
  home     careers     become a partner     portal     contact  
 
 
 

Oxidation

Recent test results delivered 20% improvement in oxide growth rate for thin films and over 5% for very thick oxides with a new technology. This new technology from RASIRC also significantly reduces costs.

Chart of Growth Rate Improvement

Users of the RASIRC Steamer demonstrated increased growth rate and uniformity by elimination of the oxygen carrier gas. By eliminating the carrier gas and blanketing the entire furnace tube in pure water vapor, RASIRC Steamer ensures that even the load end of the furnace tube reaches maximum theoretical growth rate.

Download the complete test data and report now.

The RASIRC Steamer provides 5 key benefits for High-Quality Production: Throughput Increase, Cost Reduction, Contamination Control, Repeatability and Safety.


Throughput Increases: Oxide Growth Rate 20% Faster

  • Increases throughput by delivering high quantities of pure steam
  • Eliminates carrier gas, extra oxygen and extra hydrogen, so there is no interference with steam diffusion into the silicon oxide and theoretical maximum growth rate is achieved
  • Eliminates thermal shadow introduced when using a torch, so the entire
    furnace tube can be used for thermal oxidation
Runs process recipes with multiple flow set points High and Low

Cost Reduction: <6 Month ROI

  • Eliminates hydrogen and oxygen costs
  • Delivers bottom line savings via increased throughput and process  uniformity

Contamination Control: Below Detection LImits

Purification Performance Results

  • Equals or exceeds the purity of pyrolitic steam by providing a very clean  repeatable source of water vapor from purified steam
  • Eliminates the torch and the particles it generates
  • Prevents particles from passing through with the steam by employing a nonporous membrane
  • Eliminates metal components and catalysts, ensuring metallic free steam

Repeatability: 100% Partial Pressure

  • Improves front to back uniformity by eliminating thermal shadow from  the torch

  • Ensures furnace saturation by delivering high quantities of steam (greater than possible with a torch)
  •  Maintains 100% partial pressure of water vapor resulting in better chamber uniformity
  • Purifies steam instead of DI water, yielding ultra high purity and consistency

The chart below shows uniformity over three runs in an 8-inch horizontal furnace. The chart shows a uniformity of +/- 1.4%. During the runs, the RASIRC Steamer delivered high quantities of steam (>30 slm) to saturate the chamber without excess heat.

Uniformity over 3 runs is +/- 4%


Safety: No Explosive Gases

  • Eliminates explosive hydrogen and oxygen

  • Eliminates high temperature external torch

  • Operates at a safe temperature, significantly lower than torches

 

Additional Information

Application Sheet - Oxidation

Application Sheet - Solar

White Paper—Growth Rate

White Paper—Method and Device for Purification and Delivery of Steam

White Paper—Urea and Ammonia Removal from Dei-Ionized Water via Steam Purification

Technical Paper - Control and Optimization of Therma Oxidation Processes for Industrial Solar Cell Fabrication

White Paper—Performance

White Paper - Wet Thermal Oxide Film Performance Exceeds Dry Oxide

Technical Paper - Thermal Oxidation as a Key Technology for High Efficiency Screen Printed Industrial Silicon Solar Cells

White Paper - Silicon Dioxide Layer Key to High Efficiency Crystalline Solar Cells

White Paper - Solar Cell Fabrication

White Paper - Improved Uniformity through New Steam Delivery Method

Oxidation Tech Note

Related Materials

Non-Uniformity Tech Note

Steamer '02 Datasheet

Steamer 125 Datasheet

Steamer 501 Datasheet

 

 

 
RASIRC Home