Water Vapor for VCSELs
Two factors are critical to yield when manufacturing the oxide aperture in VCSELs:
- Oxide growth rate
- Film quality
Oxide growth rate is limited by temperature and water vapor pressure while film quality is limited by contaminants.
Users of the RASIRC Steamer demonstrated increased growth rate and uniformity by elimination of the oxygen carrier gas.
The RASIRC Steamer steam purification system provides an alternative to bubblers and vaporizers by increasing the partial pressure of water and improving water vapor purity.
| Purification Performance Results (ppb) |
| |
DI Water Source |
Pre-Purified Steam |
Purified Steam |
| Total Metals |
19.8 |
0.15 |
0.009 |
| Total Organic Carbon |
1200 |
380 |
22 |
| Total Silica |
28 |
4.3 |
0.7 |
| Urea |
2200 |
48 |
2.6 |
| Ammonium |
1.468 |
1.117 |
0.116 |
Replace existing bubblers and vaporizers with the RASIRC Steamer for higher flow rates, better uniformity and improved contamination control.
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