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Better than Bubblers

Users of bubblers are well aware of their problems including: limited flow rates, film contamination, water filling, and non-uniformity. The RASIRC Steamer has demonstrated improved growth rates and uniformity by elimination of the oxygen carrier gas.

Bubbler versus Steamer Growth Rate

The growth rate of the oxide layer is directly related to the effective diffusion coefficient of the water molecules into the oxide layer and the equilibrium concentration in the immediate area. When a carrier gas is used to deliver water vapor, the carrier gas molecules generate a partial pressure. This partial pressure lowers the partial pressure of water vapor and slows the diffusion of water into the oxide film. The result is lower driving force and slower growth rate.

The RASIRC Steamer compensates for the partial pressure created by the carrier gas by delivery of ultrapure steam at a constant positive pressure. By eliminating the carrier gas and blanketing the entire furnace tube in pure water vapor, even the loading end of the furnace tube reaches maximum theoretical growth rate.

The RASIRC Steamer eliminates contaminants that bubblers pass through to the process. The RASIRC Steamer uses a non-porous hydrophilic membrane that selectively allows water vapor to pass. Selectivity is significant with up to 1,000,000x relative to nitrogen molecules. In the vapor phase, the membrane only allows water. All other molecules are greatly restricted, so contaminants in water such as dissolved gases, ions, TOCs, particles, viruses, bacteria, pyrons, and metals can be removed in the steam phase.

  RASIRC Steamer Pyrolitic Torch Catalytic Systems Bubbler Direct Liquid Injection
Acquisition Cost

 

       
Operating Cost          
Scalability          
Particulate          
Purity          
Flow Control          
Accuracy          
Safety          

Additional Information

 

Upcoming Events

See us in L3/H4/D11 at PVSEC 6 - 9 September 2010

Recent News

Sept 1, 2010
Leading Chinese Solar Cell Manufacturer Orders RASIRC Steamers

July 9, 2010
RASIRC & Fraunhofer CNT Collaborate in Development of High-K Dielectrics

June 17, 2010
RASIRC & the Fraunhofer Institute present Purified Steam for Industrial Thermal Oxidation Processes, at IEEE Photovoltaic Conference

June 10, 2010
RASIRC Presents Water Vapor Delivery for CIGSe and Other Thin Film Vacuum Processes at IEEE Photovoltaic Conference

February 25, 2010
RASIRC Granted Patent for Specialty Seal in Ultrapure Environment

February 10, 2010
Matheson Tri-Gas and RASIRC Sign Exclusive Distribution Deal for RASIRC Products

Article
Alternative Method for Steam Generation for Thermal Oxidation of Silicon
—Gases & Instrumentation Magazine

Technical Paper
Passivation Quality of Wet Oxides Grown from Purified Steam

Article
Steamer vs. torch in PV manufacturing—a cost of ownership comparison

Awards

Connect 2007 Finalist

MicroNano 2007

RASIRC was selected as a winner to appear in the 2006 Semicon West Technology Innovation Showcase

RASIRC won the Attendees' Choice Award at Semicon West 2006

RASIRC won the 2006  Gassy Award

RASIRC is profiled in this video, aired on Fox Connect

 
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