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Better than Bubblers

Users of bubblers are well aware of their problems including: limited flow rates, film contamination, water filling, and non-uniformity. The RASIRC Steamer has demonstrated improved growth rates and uniformity by elimination of the oxygen carrier gas.

Bubbler versus Steamer Growth Rate

The growth rate of the oxide layer is directly related to the effective diffusion coefficient of the water molecules into the oxide layer and the equilibrium concentration in the immediate area. When a carrier gas is used to deliver water vapor, the carrier gas molecules generate a partial pressure. This partial pressure lowers the partial pressure of water vapor and slows the diffusion of water into the oxide film. The result is lower driving force and slower growth rate.

The RASIRC Steamer compensates for the partial pressure created by the carrier gas by delivery of ultrapure steam at a constant positive pressure. By eliminating the carrier gas and blanketing the entire furnace tube in pure water vapor, even the loading end of the furnace tube reaches maximum theoretical growth rate.

The RASIRC Steamer eliminates contaminants that bubblers pass through to the process. The RASIRC Steamer uses a non-porous hydrophilic membrane that selectively allows water vapor to pass. Selectivity is significant with up to 1,000,000x relative to nitrogen molecules. In the vapor phase, the membrane only allows water. All other molecules are greatly restricted, so contaminants in water such as dissolved gases, ions, TOCs, particles, viruses, bacteria, pyrons, and metals can be removed in the steam phase.

  RASIRC Steamer Pyrolitic Torch Catalytic Systems Bubbler Direct Liquid Injection
Acquisition Cost

 

       
Operating Cost          
Scalability          
Particulate          
Purity          
Flow Control          
Accuracy          
Safety          

Additional Information

 


Recent News

Article
Comparison of Water Vapor to Ozone for growth of ALD Films
—Gases & Instrumentation Magazine

October 13, 2011
RASIRC Introduces New Steamer Turbo with Integrated Hot Gas Blending

September 27, 2011
RASIRC Ranked #1024 on Inc. 5000 List of Fastest Growing Companies

Technical Paper
Properties of Purified Direct Steam Grown Silicon Thermal Oxides

-Solar Energy Materials & Solar Cells

September 14, 2011
RASIRC Presents Poster on Use of Water Vapor in Atomic Layer Deposition

Article
Water Vapor Delivery for Thin Film Vacuum Processes
—Readout

August 31, 2011
RASIRC Relocates to Larger Facility

June 15, 2011
Fraunhofer Quantifies Steam Purity PV Benefits
—BetaInsights Article

May 26, 2011
RASIRC Steamer Used in Fraunhofer ISE'S MWT-PERC Solar Cell Manufacturing Process

May 5, 2011
RASIRC Presents Poster at SiliconPV on Importance of High Purity Steam for Oxide Growth and its Metals-Reject Efficiency

Mar 22, 2011
RASIRC Awarded Contract by Lockheed Martin: Company’s RainMaker Humidifiers to be used in ISIS Airship

Article
Water Vapor Delivery for CIGSE and Other Thin Film Vacuum Processes
—EverythingAboutEnvironment

Sept 1, 2010
Leading Chinese Solar Cell Manufacturer Orders RASIRC Steamers

Article
Alternative Method for Steam Generation for Thermal Oxidation of Silicon
—Gases & Instrumentation Magazine

Technical Paper
Passivation Quality of Wet Oxides Grown from Purified Steam

 
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