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Replace your Pyrolitic Torch or Catalytic System

Pyrolytic generation of water vapor is costly, dangerous and limits your maximum growth rate.

The RASIRC Steamer has demonstrate increased growth rate and uniformity by elimination of non-stoichiometric oxygen or hydrogen gas needed to prevent popping in the furnace.

Torch versus Steamer Growth Rate

The growth rate of the oxide layer is directly related to the effective diffusion coefficient of the water molecules into the oxide layer and the equilibrium concentration in the immediate area. When excess gas is added to the water vapor, the partial pressure of water vapor is lowered and slows the diffusion of water into the oxide film. The result is lower driving force and slower growth rate.

The RASIRC Steamer generates ultra high purity steam at a constant positive pressure. By eliminating the excess oxygen or hydrogen gas and blanketing the entire furnace tube in pure water vapor, even the loading end of the furnace tube reaches maximum theoretical growth rate.

The RASIRC Steamer eliminates contaminants. The RASIRC Steamer uses a non-porous hydrophilic membrane that selectively allows water vapor to pass. Selectivity is significant with up to 1,000,000x relative to nitrogen molecules. In the vapor phase, the membrane only passes water vapor. All other molecules are greatly restricted, so contaminants in water such as dissolved gases, ions, TOCs, particles, viruses, bacteria, pyrons, and metals can be removed in the steam phase.

Purification Performance Results (ppb)
  DI Water Source Pre-Purified Steam Purified Steam
Total Metals 19.8 0.15 0.009
Total Organic Carbon 1200 380 22
Total Silica 28 4.3 0.7
Urea 2200 48 2.6
Ammonium 1.468 1.117 0.116

Improve safety, reduce cost, and improve yield by switching to the RASIRC Steamer.

Additional Information

 


Recent News

Article
Comparison of Water Vapor to Ozone for growth of ALD Films
—Gases & Instrumentation Magazine

October 13, 2011
RASIRC Introduces New Steamer Turbo with Integrated Hot Gas Blending

September 27, 2011
RASIRC Ranked #1024 on Inc. 5000 List of Fastest Growing Companies

Technical Paper
Properties of Purified Direct Steam Grown Silicon Thermal Oxides

-Solar Energy Materials & Solar Cells

September 14, 2011
RASIRC Presents Poster on Use of Water Vapor in Atomic Layer Deposition

Article
Water Vapor Delivery for Thin Film Vacuum Processes
—Readout

August 31, 2011
RASIRC Relocates to Larger Facility

June 15, 2011
Fraunhofer Quantifies Steam Purity PV Benefits
—BetaInsights Article

May 26, 2011
RASIRC Steamer Used in Fraunhofer ISE'S MWT-PERC Solar Cell Manufacturing Process

May 5, 2011
RASIRC Presents Poster at SiliconPV on Importance of High Purity Steam for Oxide Growth and its Metals-Reject Efficiency

Mar 22, 2011
RASIRC Awarded Contract by Lockheed Martin: Company’s RainMaker Humidifiers to be used in ISIS Airship

Article
Water Vapor Delivery for CIGSE and Other Thin Film Vacuum Processes
—EverythingAboutEnvironment

Sept 1, 2010
Leading Chinese Solar Cell Manufacturer Orders RASIRC Steamers

Article
Alternative Method for Steam Generation for Thermal Oxidation of Silicon
—Gases & Instrumentation Magazine

Technical Paper
Passivation Quality of Wet Oxides Grown from Purified Steam

 
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