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Replace your Pyrolitic Torch or Catalytic System

Pyrolytic generation of water vapor is costly, dangerous and limits your maximum growth rate.

The RASIRC Steamer has demonstrate increased growth rate and uniformity by elimination of non-stoichiometric oxygen or hydrogen gas needed to prevent popping in the furnace.

Torch versus Steamer Growth Rate

The growth rate of the oxide layer is directly related to the effective diffusion coefficient of the water molecules into the oxide layer and the equilibrium concentration in the immediate area. When excess gas is added to the water vapor, the partial pressure of water vapor is lowered and slows the diffusion of water into the oxide film. The result is lower driving force and slower growth rate.

The RASIRC Steamer generates ultra high purity steam at a constant positive pressure. By eliminating the excess oxygen or hydrogen gas and blanketing the entire furnace tube in pure water vapor, even the loading end of the furnace tube reaches maximum theoretical growth rate.

The RASIRC Steamer eliminates contaminants. The RASIRC Steamer uses a non-porous hydrophilic membrane that selectively allows water vapor to pass. Selectivity is significant with up to 1,000,000x relative to nitrogen molecules. In the vapor phase, the membrane only passes water vapor. All other molecules are greatly restricted, so contaminants in water such as dissolved gases, ions, TOCs, particles, viruses, bacteria, pyrons, and metals can be removed in the steam phase.

Purification Performance Results (ppb)
  DI Water Source Pre-Purified Steam Purified Steam
Total Metals 19.8 0.15 0.009
Total Organic Carbon 1200 380 22
Total Silica 28 4.3 0.7
Urea 2200 48 2.6
Ammonium 1.468 1.117 0.116

Improve safety, reduce cost, and improve yield by switching to the RASIRC Steamer.

Additional Information

 

Upcoming Events

See us in L3/H4/D11 at PVSEC 6 - 9 September 2010

Recent News

Sept 1, 2010
Leading Chinese Solar Cell Manufacturer Orders RASIRC Steamers

July 9, 2010
RASIRC & Fraunhofer CNT Collaborate in Development of High-K Dielectrics

June 17, 2010
RASIRC & the Fraunhofer Institute present Purified Steam for Industrial Thermal Oxidation Processes, at IEEE Photovoltaic Conference

June 10, 2010
RASIRC Presents Water Vapor Delivery for CIGSe and Other Thin Film Vacuum Processes at IEEE Photovoltaic Conference

February 25, 2010
RASIRC Granted Patent for Specialty Seal in Ultrapure Environment

February 10, 2010
Matheson Tri-Gas and RASIRC Sign Exclusive Distribution Deal for RASIRC Products

Article
Alternative Method for Steam Generation for Thermal Oxidation of Silicon
—Gases & Instrumentation Magazine

Technical Paper
Passivation Quality of Wet Oxides Grown from Purified Steam

Article
Steamer vs. torch in PV manufacturing—a cost of ownership comparison

Awards

Connect 2007 Finalist

MicroNano 2007

RASIRC was selected as a winner to appear in the 2006 Semicon West Technology Innovation Showcase

RASIRC won the Attendees' Choice Award at Semicon West 2006

RASIRC won the 2006  Gassy Award

RASIRC is profiled in this video, aired on Fox Connect

 
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