Particle-free water vapor for oxidation and ALD applications. Get precision control with no water droplets using DI water.Tell Me More
Water-free or humidified hydrogen peroxide gas. You choose. Peroxide gas is ideal for surface functionalization, passivation, area selective deposition, multi-patterning ALD, gap fill and more.Tell Me More
Pure, dry and safe hydrazine gas. Great for low temperature nitride ALD. Enables low resistivity with no oxygen contamination.Tell Me More
RASIRC enables new process innovation with specialty gas generation
RASIRC products convert low vapor-pressure liquid chemistries into safe, reliable gas flow. These highly reactive chemistries generate thin oxide and nitride films required for high aspect ratio and complex 3D structures in advanced microprocessors and memory.
BRUTE Hydrazine converts liquid hydrazine into pure, dry and safe hydrazine gas. This gas is effective for low temperature nitride ALD. BRUTE Hydrazine is highly effective for low temperature nitride ALD, including generation of titanium nitride, tantalum nitride and cobalt nitride films. BRUTE Hydrazine generates ultra-thin films with low resistivity and no oxygen contamination.
Learn about BRUTE Hydrazine.
BRUTE Peroxide converts liquid peroxide into water-free peroxide gas. This gas can be used for several specialized deposition applications. BRUTE Peroxide can be used for surface functionalization, surface passivation and area selective deposition. BRUTE Peroxide delivers a self-limiting, high density nucleated film that does not damage protected surfaces or oxidize the sub-surface.
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Peroxidizer® and HPS
The Peroxidizer and Hydrogen Peroxide Steamer convert liquid hydrogen peroxide into humidified peroxide gas. This gas has a myriad of applications for next generation devices. The Peroxidizer and Hydrogen Peroxide Steamer (HPS) can be used for multiple-patterning ALD, gap fill, residual carbon removal, PR/ARC pre-treatment and more. The Peroxidizer and Hydrogen Peroxide Steamer generate high quality films at low temperature in high throughput ALD applications with no surface damage.
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RainMaker® Humidification System (RHS)
The RainMaker Humidification System (RHS) converts liquid water into particle-free water vapor. This water vapor can then be used for oxidation. The RainMaker Humidification System (RHS) can be used in a wide variety of oxidation and ALD applications. The RainMaker Humidification System (RHS) provides precision control of water vapor delivery with no water droplets using DI water as its source.
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Latest News & Views
RASIRC Presents Process Control ‘Ins and Outs’ for Optimized Mass DeliveryPublished March 14, 2019
Dynamic gas generation leader RASIRC will present new data on process optimization for low temperature ALD at the upcoming ALD for Industry 2019 conference. The presentation entitled “Optimization of Delivered Mass from Low Vapor Pressure Precursors through Process Control” is scheduled for 13:50 on Wednesday March 20 as part of the ALD Precursor Development session. RASIRC is a Gold Sponsor and exhibitor at the event held March 19-20 in Berlin, Germany.Read The Rest
RASIRC low temperature ALD of silicon and metal nitridesPublished on July 27th 2018
RASIRC in collaboration with The University of Texas, Dallas has recently developed a low temperature thermal ALD process using the standard silicon precursor in CVD, HCDS and their new hydrazine formulation for a liquid source anhydrous hydrazine in a proprietary solvent.Read The Rest
RASIRC to Present Anhydrous Hydrogen Peroxide Surface Preparation and Enhanced Nucleation for ASD at ASD2018Published on July 15th 2014
RASIRC and their collaborative network of leading scientists and customers around the world have in recent years conducted exciting work with anhydrous hydrogen peroxide.Read The Rest