Articles and Coverage

January/February 2015
Gases & Instrumentation
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

September 2013
Gases & Instrumentation
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

July/August 2012
Gases & Instrumentation
A New Approach for Improved Uniformity of Thin Thermal Oxides Using Water Vapor: A Case Study

April 2012
Energy Procedia
Water vapor delivery to vacuum process for photovoltaic applications

March 2012
Solid State Technology
RASIRC wet thermal oxidation cuts oxide film fab time

November/December 2011
Gases & Instrumentation
Comparison of Water Vapor to Ozone for growth of ALD Films

October 2011
Steam + gas subsystem targets film uniformity, better wafer cleaning, and PV fab steps

May 2011
Fraunhofer ISE finds that Rasirc Steamer promotes 20.2% efficiency in back contact c-Si solar cells

June 15, 2011
Fraunhofer Quantifies Steam Purity PV Benefits

February 2011
Water Vapor Delivery for Thin Film Vacuum Processes

July/August 2010
Water Vapor Delivery for CIGSE and Other Thin Film Vacuum Processes

May 2010
Future Photovoltaics
Comparison of PV Efficiency Using Different Types of Steam for Wet Thermal Oxidation

January/February 2010
Gases & Instrumentation Magazine
Alternative Method for Steam Generation for Thermal Oxidation of Silicon

May/June 2009
Global Solar Technology
Steamer vs. torch in PV manufacturing—a cost of ownership comparison

October 2008
Vacuum Technology & Coating
Water Vapor and Carbon Nanotubes

October 2008
Semiconductor International
Steam Generator

July 2008
Semiconductor International
SemiconWest 2008 Executive Outlook

April 2008
Full steam ahead

March 2008
Solid State Technology
Using ultrapure steam for water-contamination control

May 2008
New Product: RASIRC raises bar on high-purity steam generation in smaller form-factor

Jan/Feb 2008
Gases & Instrumentation
An Alternative Method and Device to Purify and Deliver Water Vapor

January 2008
Semiconductor International
Executive Outlook: Driving Productivity, CoO in 2008

October 1, 2007
Small Times
RASIRC says steam creates uniform nanotubes

October 2007
Steam delivery method improves oxide growth rate and uniformity

June 6, 2007
Small Times
Nanomanufacturing supply chain reaches beyond R&D

Solid State Technology
Controlling water vapor in gas streams

Power Engineering
Products: RASIRC Humidifier

May 29, 2007
ChipShots Blog, MicroMagazine
Catching up at NSTI with RASIRC’s Jeff Spiegelman

May 21, 2007
Semiconductor FabTech
New Product: RASIRC raises bar on high-purity steam generation in smaller form-factor

November 2006
Compound Semiconductor
Steam Generator Purifies Oxidation

Humidifier Allows Sterile Transfer of Water Vapor into Process Gases

August 2006
Controlled Environments
Use and generation of UHP steam has become widespread and has applications in critical processes in diverse markets

July 12, 2006
Gases and Technology Magazine
3rd Annual Gassy's Award Winners Announced at SEMICON® West: RASIRC Wins With Intaeger UHP

July 6, 2006
RASIRC introduces Intaeger UHP ultra-high-purity steam generator

July 2006
Solid State Technology
SEMICON WEST PREVIEW: Expanded innovation showcase spans gamut from desktop e-beam generation to electrically measuring low-k stacks

June 17, 2006
Fox News
RASIRC is profiled as part of Fox Connect (Watch Video)

June 15, 2006
Semiconductor International
Steam Generator: SEMICON West 2006 Front-End Products

June 15, 2006
Semiconductor International
New Technologies at SEMICON West 2006: Executive Viewpoints (Jeffrey Spiegelman presents views on the roadmap)

April 2006
Micro Magazine
UHP DI-water steam has thermal, cleaning applications in chipmaking

February 2006
Method and Device for Purification and Delivery of Steam
Paper Presented at SPWCC.


Recent News

July 9, 2015
Hydrogen Peroxide Gas for Next Generation Semiconductor Processes
RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions

June 25, 2015
RASIRC Presents Test Results Showing Stable Delivery of Hydrogen Peroxide Gas With or Without Water

June 17, 2015
New RASIRC Peroxidizer® Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes

January/February 2015
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

October 21, 2014
RASIRC Technology Successfully Used to Clean and Prepare Germanium Surfaces: High Purity Hydrogen Peroxide Vapor Delivered In-Situ

September 15, 2014
RASIRC enables liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

July 23, 2013
RASIRC Announces Dry Peroxide™ Oxidant at ALD 2013

July 8, 2013
RASIRC to Bring Dry Peroxide™ to SemiconWest/InterSolar 2013

June 27, 2013
RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition

May 30, 2013
RASIRC Presents at Sematech Surface Preparation and Cleaning Conference

May 8, 2013
RASIRC Presents Poster on Novel Hydrogen Peroxide Vapor Delivery System

October 25, 2012
RASIRC Introduces Steamer 225 for Vacuum & Atmospheric Processes

October 9, 2012
RASIRC Earns ISO 9001:2008 Certification

September 18, 2012
RASIRC Releases Results on Hydrogen Peroxide Vapor Delivery Systems for Surface Cleaning

Aug 28, 2012
MATHESON Acquires Majority Share of RASIRC