2017 Events

Date Event Location
Jan 17-18 ALD for Industry Dresden, Germany
Mar 26-28 Materials for Metallization (MAM) Dresden, Germany
Apr 20-21 Area Selective Deposition Workshop Eindhoven
May15-18 ASMC Saratoga Springs, NY
May 28-June 2 ECS 231st Meeting New Orleans, LA
June 11-14 BalticALD Linkoping, Sweden
July 11-13 SemiconWest San Francisco, CA
July 15-18 ALD Denver, CO
Oct 29-Nov 3 AVS Tampa, FL

ASMC 2017 ALD for Industry 2017 SiliconPV ALD 2017 SemiconWest 2017 AVS 2017 ECS Spring 2017 materials for metallization 2017 area selective deposition conference BalticALD 2017

ASMC 2017 ALD for Industry 2017 SiliconPV ALD 2017 SemiconWest 2017 AVS 2017 ECS Spring 2017 BalticALD 2017


Recent News

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor