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Recent News

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery: RHS Solves ALD delivery problems by eliminating particles and microdroplets at very high or very low flow rates
(PDF version)

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017 BRUTE Peroxide and BRUTE Hydrazine showcased in technical presentations
(PDF version)

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference: Company to present Brute Hydrazine results for low temperature titanium nitride
(PDF version)

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017: Company to discuss hydrazine for low temperature metal nitride ALD
(PDF version)

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017
PDF version)

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization
(PDF version)

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017: Company Shows Low Resistivity Results Enabled by Ultra High Purity Hydrazine
(PDF version)

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films: Company Features New Laboratory-Sized Vaporizer at ALD for Industry 2017
(PDF version)

View all Press Releases

Recent Articles and Coverage

January 4, 2017
Bald Engineering Blog
RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog
Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

September 2016
Bald Engineering Blog
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

June 2016
Bald Engineering Blog & LinkedIn Post
Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 2016
LinkedIn Post
Rocket Fuel May Propel Moore's Law

January/February 2015
Gases & Instrumentation
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

September 2013
Gases & Instrumentation
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

View all Articles and Coverage

 


Recent News

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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