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Recent News

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films: Company Features New Laboratory-Sized Vaporizer at ALD for Industry 2017
(PDF version)

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS
(PDF version)

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step
(PDF version)

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year
(PDF version)

July 21, 2016
RASIRC Presents Two New Molecules for Growth of Low Temperature Nitrides and Oxides at ALD Conference
(PDF version)

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer
(PDF version)

May 31, 2016
RASIRC Presents Novel Source for Oxidation and Nitridation for Atomic Layer Deposition
(PDF version)

May 17, 2016
RASIRC Presents Hydrazine as Low Temperature Nitride Source at Critical Materials Conference
(PDF version)

April 14, 2016
RASIRC to Present at Surface Preparation and Cleaning (SPCC) Conference
(PDF version)

View all Press Releases

Recent Articles and Coverage

January 4, 2017
Bald Engineering Blog
RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2017
Bald Engineering Blog
Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

September 2016
Bald Engineering Blog
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

June 2016
Bald Engineering Blog & LinkedIn Post
Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 2016
LinkedIn Post
Rocket Fuel May Propel Moore's Law

January/February 2015
Gases & Instrumentation
Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

September 2013
Gases & Instrumentation
Nafion-based Drying Apparatuses for Humidity Removal from Sample Gas Prior to GC/MS Analysis

View all Articles and Coverage

 


Recent News

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2017
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
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