RASIRC Selected by SEMI as Technology Innovation Showcase Winner
Ultra pure steam generation to preview at SEMICON West
San Diego, Calif. - June 6, 2006 - RASIRC®, the steam purification company, announces that it has been selected by SEMI as a 2006 Technology Innovation Showcase (TIS) winner. As a TIS winner, RASIRC will showcase its new ultra pure steam generation products and technology at SEMICON West, held in the Moscone Convention Center in San Francisco, Calif, July 11 - 13, 2006 in the Esplanade booth T-14.
SEMI created the TIS program to provide a platform for highlighting innovative companies, inventors, and entrepreneurs by exposing their innovations to a broad audience of semiconductor manufacturers, suppliers, and investors. Participation was open to anyone with a solution to a real industry problem, including individual inventors, start-ups, academia, research institutions, and large companies. Innovations and applications submitted for consideration in the competition were reviewed by judges using a strict set of criteria including technical merit as well as relevance and significance to the semiconductor and related industries.
RASIRC's technology has many applications in the semiconductor and related industries. Ultra high purity steam controls the humidity in a cleanroom. Steam is commonly used as the source gas for generating oxide films on semiconductor wafers in diffusion and rapid thermal processing. Next generation films used in atomic layer deposition (nanotechnology) will require ultra pure steam for formation of the high K layer. Ultra high purity steam can also effectively remove contaminants from next generation structures. As device feature sizes continue to shrink and aspect ratios increase, the ability to get sufficient energy into the bottom of the trench becomes less and less efficient with megasonics. Steam provides high energy and excellent contaminant removal capability, so is well poised to become the cleaning process of choice for next generation wafer cleaning. In addition, the move to immersion lithography will require water that is absolutely pure and bubble free.
"Our selection as a Technology Innovation Showcase winner is a testament to the vision and engineering capabilities of our RASIRC team and confirms our belief in the importance and need for safe, effective, and cost efficient delivery of ultra pure liquids and gases in the semiconductor, as well as other, industries," said Jeffrey Spiegelman, founder and president of RASIRC.
The SEMICON West exposition has been held annually since 1972 and attracted about 44,000 industry registrants in 2005. The exposition continues to be the global communication platform for the worldwide semiconductor equipment and materials industry.
SEMI is a global industry association serving companies that provide equipment, materials, and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS), and related technologies. For more information, visit www.semi.org.
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