RASIRC Honored with Three Awards Presented at SEMICON West 2006

Wins Attendees' Choice Award, Gassy Award, and Technology Innovation Showcase

San Diego , Calif. - July 25, 2006 - RASIRC®, the steam purification company, announced that it won three honors for its Intaeger™ UHP ultra high purity steam generator. RASIRC received Gases and Technology magazine's Gassy Award, Solid State Technology and Advanced Packaging magazines' Attendees' Choice Awards, and they were selected for SEMI's Technology Innovation Showcase. The awards were presented during the SEMICON West trade show, held in San Francisco , California from July 11-14, 2006.

The Intaeger UHP is the first product to provide ultra high purity steam and process control with a safe, non-combustible system that doesn't require hydrogen and oxygen to generate water vapor. Steam is produced by boiling de-ionized water, which is inexpensive and widely available. Water contaminants, including dissolved gases, are removed, metallic impurity sources are eliminated, and particle sources are greatly reduced. Producing UHP water vapor using Intaeger is an e xtremely efficient process, maximizing throughput.

The Intaeger UHP received the 2006 Gassy Award in the On-Site Generation category for its innovation, cost effectiveness, speed/throughput improvements, quality and ease of use, maintainability/repairability, and environmental responsibility. The award, sponsored by Gases & Technology magazine, was judged by an independent committee of seven experts representing science, academia, and users in industry. Each submission was evaluated on its ability to meet a significant industry challenge; creative application of a new or existing technology; overall quality and consistency of performance; economic merits; and throughput characteristics. Gases & Technology magazine is the leading trade publication for the major high technology specialty gases markets.

"RASIRC has demonstrated its technical prowess by delivering a product that fulfills an industry need for safe, efficient, UHP steam generation," said Paul Nesdore, chief editor of Gases and Technology magazine.

RASIRC's Intaeger UHP garnered the Attendees' Choice Award for Best Cost of Ownership. The award, sponsored by Solid State Technology and Advanced Packaging magazines ( PennWell publications), is based on a vote by attendees to the SEMICON West trade show. The award was presented by David Barach, group publisher for both publications, and Phil LoPiccolo, Solid State Technology editor-in-chief. Solid State Technology is the longest-running complete news, data, and research source for semiconductor manufacturing. Advanced Packaging serves those in operations that integrate electronic component packages into circuitry of their end products.

SEMI's Technology Innovation Showcase (TIS) program provides a platform for highlighting innovative companies, inventors, and entrepreneurs by exposing their innovations to a broad audience of semiconductor manufacturers, suppliers, and investors. The Intaeger UHP was reviewed by judges using a strict set of criteria including technical merit as well as relevance and significance to the semiconductor and related industries. As an award winner, RASIRC was a featured company in the TechXpot portion of SEMICON West. SEMI is a global industry association serving companies that provide equipment, materials, and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS), and related technologies.

"We are very excited and pleased at the recognition of RASIRC's technology and the Intaeger UHP ultra high purity steam generator, first by SEMI for our innovation and then by Gases and Technology and Solid State Technology/Advanced Packaging ," said Jeffrey Spiegelman, founder and president of RASIRC. " Winning the Gassy Award, which is judged by people directly involved with gas technology and its related industries, confirms that our system is an important contribution to industries requiring ultra high purity water vapor."

The Attendees' Choice Award has special meaning because it is based on votes from people in the industry. "When we designed the Intaeger UHP, we knew that the safety and purity benefits derived by generating steam using de-ionized water, an electric bulb, and RASIRC's patented membrane material far exceeded existing steam generation systems," said Spiegelman. "That the Intaeger UHP has a low cost of ownership is an added benefit. Most companies can realize a return on investment within six months."


Recent News

March 19, 2018
RASIRC Turns Thermal Mass Flow Measurement of Dilute Reactive Gas Species Inside Out

February 26, 2018
RASIRC Discusses Role of Hydrogen Peroxide Gas in Advanced Lithography

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor