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RASIRC Features Ultra High Purity Water Vapor Systems at SEMICON West 2007 in Booth 3051

San Diego, Calif. – SEMICON West 2007 – RASIRC™, the steam purification company, is exhibiting its high flow, ultra high purity (UHP) water vapor systems at SEMICON West’s South Hall Booth 3051 from July 17- 19, 2007 in San Francisco, CA. RASIRC systems generate UHP steam from de-ionized water without using hydrogen or oxygen. Products on display are the RASIRC Steamer UHP, RainMaker™ Humidifier, and RainMaker Humidification System.

The RASIRC Steamer UHP provides unique UHP steam and process control in a safe, non-combustible system that does not require hydrogen and oxygen to generate water vapor. Water contaminants, including dissolved gases, metallic impurities, and particles are removed, resulting in purity equal to or better than pyrolytic steam. The Steamer replaces torches in wet thermal oxidation, yielding improved growth rate, better uniformity, and safer operations in semiconductors, MEMs, and photovoltaic cell applications.

The RainMaker™ Humidifier controls the transfer and purification of water vapor directly into a carrier gas stream at a wide range of flow rates. It provides humidification in applications requiring controlled water vapor, including purging, lithography and humidity control in cleanrooms.

The RainMaker HS delivers repeatable amounts of water vapor into carrier gases, independent of the process pressure. The RainMaker Humidification System is for applications requiring low amounts of water vapor, such as rapid thermal processing (RTP), atomic layer deposition (ALD), etch plasma stripping, and fabrication of carbon nanotubes.

“Our steam purification systems have achieved faster growth rates and better uniformity over torches, bubblers and direct liquid injection (DLI) systems by exclusively being able to deliver very high flow rates of 100% water vapor,” said Jeffrey Spiegelman, founder and president of RASIRC. “In certain applications, such as thick oxide growth, overall process times have been reduced by almost 20%, freeing up an extra day of process time per week. We are constantly discovering more applications that can benefit substantially from using ultra pure steam.”

 

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Awards

Connect 2007 Finalist

MicroNano 2007

RASIRC was selected as a winner to appear in the 2006 Semicon West Technology Innovation Showcase

RASIRC won the Attendees' Choice Award at Semicon West 2006

RASIRC won the 2006  Gassy Award

RASIRC is profiled in this video, aired on Fox Connect

 
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