RASIRC Home
 

RASIRC Relocates to Larger Facility

Company doubles manufacturing and development space

San Diego, Calif. – August 31, 2011 – RASIRC®, the steam purification company, announced today that it has relocated its global operations to a significantly larger facility. The new 19,500 square foot space includes a class 1,000 cleanroom for manufacturing products for the photovoltaic industry. RASIRC products deliver ultra-pure water vapor for semiconductor, photovoltaics, nanotechnology, and other manufacturing applications.

“Rapid growth in RASIRC products required a new facility to handle higher volumes,” said Jeffrey Spiegelman, RASIRC founder and president. “This expansion allows us to handle the increased production and doubles our R&D lab space.”

RASIRC is experiencing continued growth in demand for its products, particularly Steamers for photovoltaic passivation films for the solar industry and humidity control for semiconductor manufacturing. In the solar industry, RASIRC products deliver ultra-pure steam that is needed to form oxidation layers that improve solar energy capture efficiency. In addition, steam can be used in conjunction with phosphorous or boron doping to improve the emitter profile. For the semiconductor industry, ultra-pure steam is used for generating oxide films on semiconductor wafers in diffusion and rapid thermal processing. Additional uses include wafer cleaning of next generation films and atomic layer deposition for high K layers. RASIRC reduces costs, improves quality, and dramatically improves safety associated with these applications.

"RASIRC has grown rapidly over the last five years," said Spiegelman. “The transition from an R&D to a manufacturing company is demonstrated by the increase in our orders from both new and repeat customers. The market validation of our products has enabled us to move into a new and larger facility, significantly increase staffing levels, and enabling us to fund development of further innovation.”

The new RASIRC address is 7815 Silverton Avenue, San Diego, CA 92126.

 


Recent News

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2017
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor

 
RASIRC Home