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RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

Company Features New Laboratory-Sized Vaporizer at ALD for Industry 2017

San Diego, Calif – January 16, 2017–RASIRC will present on innovative chemistries for low temperature oxide and nitride films at the ALD for Industry 2017 conference held in Dresden, Germany January 17 and 18. The presentation, scheduled during the EFDS Workshop, will discuss how unique formulations of hydrogen peroxide and hydrazine are effective for oxidation and nitridation of new materials and metals. The company will also feature its new Laboratory version of BRUTE Hydrazine, designed specifically for universities and research institutes.

RASIRC is a conference sponsor and will also participate in the exhibition. ALD for Industry is sponsored by the European Society for Thin Films (EFDS) and is a topical workshop focused on industrialization and commercialization of ALD for current and emerging markets.

RASIRC BRUTE® Peroxide and BRUTE Hydrazine both use a proprietary membrane delivery system to enable delivery of pure gases. The company recently released a compact Laboratory version designed for use under vacuum draw. This plug-and-play version enables universities, research institutes and smaller testing environments to work with the chemistry without changing the laboratory tools.

“The Laboratory version will enable universities and R&D laboratories to test a small volume of chemistry for proof of concept,” said Jeffrey Spiegelman, RASIRC President and Founder. “When these tests successfully prove efficacy, the organizations can ramp up volume and move into larger scale chemical delivery systems.”

 


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