RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017
Company to discuss hydrazine for low temperature metal nitride ALD
San Diego, Calif – May 22, 2017–RASIRC will present at the 231st ECS Meeting held May 28-June 1 in New Orleans, Louisiana. The presentation will discuss a novel Hydrazine delivery method for low temperature metal nitride ALD. Chief Technology Officer Daniel Alvarez will present “Ultra-High Purity Hydrazine Delivery for Low Temperature Metal Nitride ALD” in Session G02: Silicon Compatible Materials, Processes and Technologies for Advanced Integrated Circuits and Emerging Applications. The presentation is scheduled for Tuesday May 30 at 4pm in Churchill B2.
There is an emerging need for sub-400°C metal nitride deposition due to thermal sensitivity of new materials for logic and memory devices. University studies have shown hydrazine to be a viable precursor for low temperature ALD. A novel high-purity hydrazine delivery system has been developed in response to market need. Initial tests show significant reduction in oxygen in TiNx films using this system.
“The use of Brute Hydrazine at low temperature potentially solves many problems faced by process engineers for new materials development,” said Jeffrey Spiegelman, RASIRC President and Founder. “This can enable the rapid integration of these materials into emerging devices.”
RASIRC BRUTE® Hydrazine uses a proprietary chemical formulation to deliver ultra-high purity hydrazine from a liquid source that is safer and has quantified low water levels. The company recently released a compact Laboratory version designed for use under vacuum draw. This plug-and-play version enables universities, research institutes and smaller testing environments to work with the chemistry without changing the laboratory tools.
About Ultra High Purity Hydrazine
Alvarez will be available throughout the conference to discuss the presentation and ongoing research. For more information after the conference, follow up by contacting RASIRC directly at email@example.com.