Rene Deubler to Drive Commercialization of RASIRC Technology

San Diego, Calif – August 1, 2017–RASIRC today announced that Rene Deubler has joined the company as Director of Sales. Deubler brings to RASIRC a proven track record of exceptional sales growth with new technologies. His past experience includes engineering, program management, field service, and sales for both domestic and European semiconductor OEMs. His primary focus is growth of sales of RASIRC products including the Peroxidizer®, Hydrogen Peroxide Steamers, BRUTE® Peroxide and Hydrazine, and the RainMaker® Humidification System (RHS).

“I was attracted to RASIRC by its reputation for solving difficult problems in semiconductor processes and then converting those solutions to unique products,” said Deubler. “I look forward to expanding the reach of our equipment and chemistries into new markets.”

Deubler holds an MBA in Project Management from the Keller Graduate School of Management. He also holds a degree in Computer Science and Electrical Engineering from Höhere Technische Lehranstalt in Austria. Prior to RASIRC, Deubler was General Manager for Von Ardenne North America, where he opened the US operation and grew the business to $76 million over six years. Prior to Von Ardenne, he was regional field service supervisor for EV Group, where he increased project efficiency, improved product quality and accelerated customer satisfaction.

“RASIRC products are poised for explosive growth for the next nodes of semiconductor manufacturing driven by our ALD and Hydrogen Peroxide technologies,” said Jeffrey Spiegelman, RASIRC President and Founder. “Rene’s background and drive will be essential in executing our global sales and marketing strategy.”


Recent News

August 1, 2017
Rene Deubler to Drive Commercialization of RASIRC Technology

July 15, 2017
RASIRC Releases Next Generation RainMaker Humidification System for Fine Water Vapor Delivery

July 13, 2017
RASIRC Presents TiN ALD Grown with BRUTE® Hydrazine at ALD Conference 2017

June 6, 2017
RASIRC to Exhibit and Present at Joint EUROCVD and Baltic ALD Conference

May 22, 2017
RASIRC Presents Ultra-High Purity Hydrazine Delivery at ECS Spring 2017

May 10, 2017
RASIRC Presents Hydrazine for Low Temperature ALD at ASMC 2017

April 19, 2017
RASIRC Presents Novel Reactive Chemistries for in-situ Surface Functionalization

March 23, 2017
RASIRC Presents Low Temperature ALD of Titanium Nitride at MAM 2017

January 16, 2017
RASIRC Presents New Chemistries for Low Temperature Oxide and Nitride Films

September 26, 20016
RASIRC® BRUTE® peroxide and hydrazine technology for leading edge memory and high performance logic

September 26, 2016
RASIRC Presents on Low Temperature Nitride Passivation at PRiME/ECS

September 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS: Atomic Layer Passivation enabled Hydrogen Peroxide Gas First Step

August 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD): Gift donation supports one student researcher for one year

June 23, 2016
RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes

June 7, 2016
RASIRC Study Finds 500 Fold Particle Reduction Using RASIRC RHS versus Flash Vaporizer

Recent Articles

Jan 4, 2017
Jonas Sundqvist
Bald Engineering Blog: RASIRC® to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

December 14, 2016
Bald Engineering Blog: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma

June 22, 2016
Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing

April 7, 2016
Solid State Technology LinkedIn
Rocket Fuel May Propel Moore's Law

Cheating Raoult’s Law to Enable Delivery of Hydrogen Peroxide as a Stable Vapor