Test RHS

Droplet-Free Water Vapor for ALD and Oxidation

The RainMaker Humidification System (RHS) is a precisely controlled oxide source for droplet-free deposition.

The RainMaker Humidification System (RHS) Enables Semiconductor Applications

VCSELs

VCSELs (Vertical-Cavity Surface-Emitting Laser) are used in a growing number of devices. These structures require precise oxidation of the aperture to form the laser channel. Aperture oxidation is controlled via process temperature, composition of the aperture structure, and water vapor delivered into the process chamber. The RHS delivers precisely controlled, ultrapure water vapor.

Precision Thermal Oxidation

Precision water-vapor delivery is difficult with standard market products. Bubblers and Flash Vaporizers are particle generators, and will hit wafers with microdroplets. This causes non-uniform oxidation and island growth on the wafer surface.

High Performance Thermal Oxides

High performance oxides require ultra-high purity water vapor in order to achieve high density, high refractive index and excellent dielectric properties. Typical impurities found in traditional water-vapor delivery products can lead to poor electrical characteristics, non-uniformity and other defects. 

RHS Beats Traditional Delivery Methods

Precision Control

The RHS can precisely control water vapor delivery at a wide range of set points and flow rates without generating particles or super saturating the gas. 

No Water Droplets

By completely changing the way water molecules are converted from liquid to gas phase, the RHS solves many of the challenges for delivery of water vapor.

Low Flow to High

The RHS is capable of controlling water vapor from 0.1 to 20 slm in both vacuum and atmospheric processes. 

Particle Free

RASIRC’s patented membrane technology to precisely add water vapor to a carrier gas only allows water to permeate, leaving all particles behind.

The RainMaker Humidification System (RHS) Enables Semiconductor Applications

VCSELs

VCSELs (Vertical-Cavity Surface-Emitting Laser) are used in a growing number of devices. These structures require precise oxidation of the aperture to form the laser channel. Aperture oxidation is controlled via process temperature, composition of the aperture structure, and water vapor delivered into the process chamber. The RHS delivers precisely controlled, ultrapure water vapor.

Precise Thermal Oxidation

Precision water-vapor delivery is difficult with standard market products. Bubblers and Flash Vaporizers are particle generators, and will hit wafers with microdroplets. This causes non-uniform oxidation and island growth on the wafer surface.

High Performance Thermal Oxides

High performance oxides require ultra-high purity water vapor in order to achieve high density, high refractive index and excellent dielectric properties. Typical impurities found in traditional water-vapor delivery products can lead to poor electrical characteristics, non-uniformity and other defects. 

RHS Beats Traditional Delivery Methods

Precision Control

The RHS can precisely control water vapor delivery at a wide range of set points and flow rates without generating particles or super saturating the gas. 

No Water Droplets

By completely changing the way water molecules are converted from liquid to gas phase, the RHS solves many of the challenges for delivery of water vapor.

Low Flow to High

The RHS is capable of controlling water vapor from 0.1 to 20 slm in both vacuum and atmospheric processes.

Particle Free

RASIRC’s patented membrane technology to precisely add water vapor to a carrier gas only allows water to permeate, leaving all particles behind.

RHS Beats Traditional Delivery Methods

Precision Control

The RHS can precisely control water vapor delivery at a wide range of set points and flow rates without generating particles or super saturating the gas. 

No Water Droplets

The RHS solves many of the challenges for delivery of water vapor by completely changing the way water molecules are converted from liquid to gas phase. RASIRC patented membrane vaporization technology leads to smooth vaporization and delivery of only gas phase water molecules without water droplets or contaminants.

Low Flow to High

The RHS is capable of controlling water vapor from 0.1 to 20 slm in both vacuum and atmospheric processes. 

Particle Free

A fundamental feature of the RHS is its ability to precisely add water vapor to a carrier gas while leaving behind water droplets and particles due to the RainMaker design. RASIRC patented membrane technology only allows water to permeate, leaving all particles behind.

RHS Beats Traditional Delivery Methods

Precision Control

The RHS can precisely control water vapor delivery at a wide range of set points and flow rates without generating particles or super saturating the gas. 

No Water Droplets

By completely changing the way water molecules are converted from liquid to gas phase, the RHS solves many of the challenges for delivery of water vapor.

Low Flow to High

The RHS is capable of controlling water vapor from 0.1 to 20 slm in both vacuum and atmospheric processes. 

Particle Free

RASIRC’s patented membrane technology to precisely add water vapor to a carrier gas only allows water to permeate, leaving all particles behind.

Get Particle Testing Results

How the RHS Works

The RHS adds controlled amounts of pure water vapor directly into any carrier gas stream. Needing only filtered house de-ionized (DI) water and power, the system delivers precise amounts of water vapor into atmospheric processes.


The RHS is an integrated water vapor delivery system featuring adaptive closed loop control. Process parameters are set through automated process recipes or the controller touchscreen. Internal pressure, flow and temperature sensors provide feedback to the control system, which automatically adjusts operations to maintain required temperature and concentration stability.


The RHS consists of a non-porous membrane that excludes particles, micro-droplets, volatile gases, and other opposite charged species from being transferred to the carrier gas and ensures only water vapor is added. The membrane selects only the source gas molecules. Other contaminants in the liquid source cannot permeate across the membrane or enter the carrier gas stream, resulting in a saturated product that is consistent and pure. 

See Latest Research on Oxides.

Latest News & Views

RASIRC products generate and deliver water vapor, hydrogen peroxide and hydrazine gas in controlled, repeatable concentrations to critical processes.

Contact

info@rasirc.com
858.259.1220

7815 Silverton Avenue
San Diego, CA 92126
USA

Social Profiles

© Copyright 2021 RASIRC – All Rights Reserved – Privacy Statement